257222 Sigma-Aldrich



Synonym: Aluminum trimethanide, TMA

  • CAS Number 75-24-1

  • Linear Formula (CH3)3Al

  • Molecular Weight 72.09

  •  Beilstein/REAXYS Number 3587197

  •  EC Number 200-853-0

  •  MDL number MFCD00008252

  •  PubChem Substance ID 24855575

  •  NACRES NA.23



Related Categories Aluminum, CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics,
Quality Level   200
vapor pressure   69.3 mmHg ( 60 °C)
description   heat of vaporization: ~41.9 kJ/mol (dimer)
assay   97%
form   liquid
bp   125-126 °C (lit.)
  127 °C/760 mmHg
  20 °C/8 mmHg
  56 °C/50 mmHg
mp   15 °C (lit.)
density   0.752 g/mL at 25 °C (lit.)
SMILES string   C[Al](C)C
InChI   1S/3CH3.Al/h3*1H3;


General description

Trimethylaluminum (TMA) is the most reactive and volatile among all organoaluminium compounds. It is extremely pyrophoric. It acts as a highly reactive reducing and alkylating agent.

Other Notes

Storage below 20°C may cause crystallization.


TMA is used in a Ziegler Natta catalyst for polymerization and hydrogenation. TMA is mainly used for the production of methylaluminoxane, such as metalorganic chemical vapor deposition (MOCVD) of:
• Al2O3 using TMA and O2 precursors.
• Al4C3 layers have been grown on Al2O3 (0001) using TMA and methane as source materials for aluminum and carbon.


100 g in Sure-Pac™

Recommended products

Angled septum-inlet adapter Z118206 or straight septum-inlet adapter, 6mm I.D. inlet, Z118141 or straight septum-inlet adapter, 13mm I.D. inlet, Z118192 is recommended.

Safety & Documentation

Safety Information

Signal word 
Hazard statements 
Supplemental Hazard Statements 
UN 3394 4.3(4.2) / PGI
WGK Germany 
Flash Point(F) 
No data available
Flash Point(C) 
No data available
Protocols & Articles


ALD — A Versatile Tool for Nanostructuring

The acronym ALD stands for atomic layer deposition. Although the process was developed during the 1970s, ALD remained more of a niche process, since initially most applications of this technique were...
Mato Knez
Material Matters 2008, 3.2, 28
Keywords: Adsorption, Applications, Atomic layer deposition, Chemical vapor deposition, Deposition, Diffusion, Electronics, Environmental, Material Matters, Methods, Nanomaterials, Nanotechnology, Nanotubes, PAGE, Reductions, Support, Thin film deposition, Tissue microarrays

Acids and Bases

Acids and bases have been used by chemists for centuries, and are among the most fundamental reagents employed in synthetic organic chemistry. This product line ranges from Brønsted and Lewis acids, ...
Chemfiles Volume 1 Article 3

Atomic Layer Deposition of Nanomaterials for Li-Ion Batteries, Fuel Cells, and Solar Cells

Erwin Kessels,* Harm Knoops, Matthieu Weber, Adrie Mackus, and Mariadriana Creatore Department of Applied Physics, Eindhoven University of Technology P.O. Box 513, 5600 MB Eindhoven, The Netherlands ...
Keywords: Adhesion, Atomic layer deposition, Building blocks, Catalysis, Chemical vapor deposition, Crystallization, Deposition, Diffusion, Microscopy, Nanomaterials, Nanotubes, Nucleic acid annealing, Oxidations, Recombination, Reductions, Renewable energy, Scanning electron microscopy, Solar cells

Dye-Sensitized and Perovskite Solar Cells: Interface Engineering by Atomic Layer Deposition

Valerio Zardetto,1 Francesco Di Giacomo,2 Thomas M. Brown,2 Aldo Di Carlo,2 Alessandra D’Epifanio,3 Silvia Licoccia,3 Erwin Kessels,1 Mariadriana Creatore1* 1Department of Applied Physics, Eindhoven ...
Keywords: Atomic layer deposition, Calorimetry, Capillary electrophoresis, Catalysis, Chemical vapor deposition, Deposition, Electronics, Materials Science, Microscopy, Photovoltaics, Positron Emission Tomography, Recombination, Reductions, Scanning electron microscopy, Semiconductor, Separation, Sol-gel, Solar cells

Nanowire Synthesis: From Top-Down to Bottom-Up

David J. Hill, James F. Cahoon* Department of Chemistry, University of North Carolina at Chapel Hill, USA *Email:
David J. Hill, James F. Cahoon*
Material Matters, 2017, 12.1
Keywords: Absorption, Catalysis, Chemical vapor deposition, Deposition, Electronics, Melting, Microelectronics, Nanomaterials, Redox Reactions, Reductions, Semiconductor

Tutorial in Microelectronics and Nanoelectronics

Barrier Materials and Precursors High κ Dielectric Materials Deposition Techniques Chemical Vapor Deposition (CVD) Atomic Layer Deposition (ALD)
Keywords: Adhesion, Atomic layer deposition, Chemical reactions, Chemical vapor deposition, Chromatin immunoprecipitation, Deposition, Diffusion, Gas chromatography, Inductively coupled plasma, Ligands, Mass spectrometry, Melting, Microelectronics, Nuclear magnetic resonance spectroscopy, Oxidations, Reductions, Semiconductor, Solvents, Substitutions, Tissue microarrays, transformation

Peer-Reviewed Papers


Related Products

septum inlet adapter

Product #


Add to Cart

Z118206 Angled septum-inlet adapter, brass, inlet I.D. 6 mm × 6 mm
Z118141 Straight septum-inlet adapter, inlet I.D. 6 mm, brass

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