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  • 379212 - Hexamethyldisilazane

379212 Sigma-Aldrich


ReagentPlus®, 99.9%

Synonym: 1,1,1,3,3,3-Hexamethyldisilazane, HMDS

  • CAS Number 999-97-3

  • Linear Formula (CH3)3SiNHSi(CH3)3

  • Molecular Weight 161.39

  •  Beilstein/REAXYS Number 635752

  •  EC Number 213-668-5

  •  MDL number MFCD00008259

  •  PubChem Substance ID 24863226

  •  NACRES NA.23



Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Materials for Surface Modification, Micro/NanoElectronics,
Quality Level   200
grade   ReagentPlus®
assay   99.9%
form   liquid
refractive index   n20/D 1.407 (lit.)
bp   125 °C (lit.)
SMILES string   C[Si](C)(C)N[Si](C)(C)C
InChI   1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3


General description

Hexamethyldisilazane (HDMS) is an organoslicon compound.HDMS is a colorless liquid used as a reagent and precursor in organic synthesis and organometallic chemistry.


Used in
• condensation reactions of heterocyclic compounds, such as derivatives of xanthine
• adhesion promoter for photoresist in photolithography
• electron microscopy, as an alternative to critical point drying during sample preparation
• pyrolysis-gas chromatography-mass spectrometry, in order to enhance detectability of compounds with polar functional groups.


25, 100 mL in Sure/Seal™

Legal Information

ReagentPlus is a registered trademark of Sigma-Aldrich Co. LLC

Safety & Documentation

Safety Information

Signal word 
Hazard statements 
UN 1992 6.1(3) / PGII
WGK Germany 
Flash Point(F) 
52.5 °F - closed cup
Flash Point(C) 
11.4 °C - closed cup
Protocols & Articles


Activating Reagents and Protecting Groups

The use of activating agents and protecting groups in organic synthesis is necessary to prevent unwanted side reactions from occurring when using other common reagents such as oxidizing or reducing a...
Chemfiles Volume 1 Article 3
Keywords: Organic synthesis

FePt Nanogranular Films for High Density Heat-assisted Magnetic Recording

Kazuhiro Hono, National Institute for Materials Research, Tsukuba 305-0047, Japan Email: kazuhiro.hono@nims.go.jp
Keywords: Deposition, Nucleic acid annealing

Nanowire Synthesis: From Top-Down to Bottom-Up

David J. Hill, James F. Cahoon* Department of Chemistry, University of North Carolina at Chapel Hill, USA *Email: jfcahoon@unc.edu
David J. Hill, James F. Cahoon*
Material Matters, 2017, 12.1
Keywords: Absorption, Catalysis, Chemical vapor deposition, Deposition, Electronics, Melting, Microelectronics, Nanomaterials, Redox Reactions, Reductions, Semiconductor

Recent Progress in Spintronic Materials

Soubantika Palchoudhury,1 Karthik Ramasamy,2* Arunava Gupta3* 1Civil and Chemical Engineering, University of Tennessee at Chattanooga, Chattanooga, Tennessee 37403, USA 2Center for Integrated Nanotec...
Soubantika Palchoudhury, Karthik Ramasamy, Arunava Gupta
By: Dr. Hui Zhu, Material Matters, 2016, 11.4
Keywords: Catalysis, Microscopy, Scanning electron microscopy, Semiconductor, Transmission electron microscopy

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA *Email: jiyoung.kim@utdallas.edu
Keywords: Atomic layer deposition, Chemical vapor deposition, Deposition, Inductively coupled plasma, Ligands, Materials Science, Semiconductor, Size-exclusion chromatography

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.1 Since then, the number of hybrid organicinorganic combinations has increased rapidly.2 Hybrid mater...
Lisa C. Klein and Andrei Jitianu
Material Matters, Volume 7, Number 2, 8–14
Keywords: Absorption, Adhesion, Calorimetry, Combustion, Condensations, Deposition, Exothermic, Filtration, Materials Science, Melting, Oxidations, Polymerization reactions, Purification, Semiconductor, Sol-gel, Solar cells, Solvents, Spin coating, Substitutions, Thermal analysis

Peer-Reviewed Papers


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