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440191 Sigma-Aldrich

Hexamethyldisilazane

reagent grade, ≥99%

Synonym: Bis(trimethylsilyl)amine, HMDS

  • CAS Number 999-97-3

  • Linear Formula (CH3)3SiNHSi(CH3)3

  • Molecular Weight 161.39

  •  Beilstein/REAXYS Number 635752

  •  EC Number 213-668-5

  •  MDL number MFCD00008259

  •  PubChem Substance ID 24867576

  •  NACRES NA.23

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Properties

Related Categories CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Organometallic Reagents,
Quality Level   200
grade   reagent grade
assay   ≥99%
form   liquid
refractive index   n20/D 1.407 (lit.)
bp   125 °C (lit.)
SMILES string   C[Si](C)(C)N[Si](C)(C)C
InChI   1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3
InChI key   FFUAGWLWBBFQJT-UHFFFAOYSA-N

Description

General description

Hexamethyldisilazane (HMDS) is used to trimethylsilylate alcohols, amines, thiols. HMDS can also be used for the preparation of trimethylsilyl ethers from hydroxy compounds.

Application

HMDS is used for specimen preparation for scanning electron microscopy.

Packaging

1 L in Sure/Seal™

100 mL in Sure/Seal™

Safety & Documentation

Safety Information

Symbol 
Signal word 
Danger
Hazard statements 
RIDADR 
UN 1992 6.1(3) / PGII
WGK Germany 
WGK 2
RTECS 
JM9230000
Flash Point(F) 
52.5 °F - closed cup
Flash Point(C) 
11.4 °C - closed cup
Protocols & Articles

Articles

FePt Nanogranular Films for High Density Heat-assisted Magnetic Recording

Kazuhiro Hono, National Institute for Materials Research, Tsukuba 305-0047, Japan Email: kazuhiro.hono@nims.go.jp
Keywords: Deposition, Nucleic acid annealing

Nanowire Synthesis: From Top-Down to Bottom-Up

David J. Hill, James F. Cahoon* Department of Chemistry, University of North Carolina at Chapel Hill, USA *Email: jfcahoon@unc.edu
David J. Hill, James F. Cahoon*
Material Matters, 2017, 12.1
Keywords: Absorption, Catalysis, Chemical vapor deposition, Deposition, Electronics, Melting, Microelectronics, Nanomaterials, Redox Reactions, Reductions, Semiconductor

Recent Progress in Spintronic Materials

Soubantika Palchoudhury,1 Karthik Ramasamy,2* Arunava Gupta3* 1Civil and Chemical Engineering, University of Tennessee at Chattanooga, Chattanooga, Tennessee 37403, USA 2Center for Integrated Nanotec...
Soubantika Palchoudhury, Karthik Ramasamy, Arunava Gupta
By: Dr. Hui Zhu, Material Matters, 2016, 11.4
Keywords: Catalysis, Microscopy, Scanning electron microscopy, Semiconductor, Transmission electron microscopy

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA *Email: jiyoung.kim@utdallas.edu
Keywords: Atomic layer deposition, Chemical vapor deposition, Deposition, Inductively coupled plasma, Ligands, Materials Science, Semiconductor, Size-exclusion chromatography

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.1 Since then, the number of hybrid organicinorganic combinations has increased rapidly.2 Hybrid mater...
Lisa C. Klein and Andrei Jitianu
Material Matters, Volume 7, Number 2, 8–14
Keywords: Absorption, Adhesion, Calorimetry, Combustion, Condensations, Deposition, Exothermic, Filtration, Materials Science, Melting, Oxidations, Polymerization reactions, Purification, Semiconductor, Sol-gel, Solar cells, Solvents, Spin coating, Substitutions, Thermal analysis

Peer-Reviewed Papers
15

References

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